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ANHUI CRYSTRO CRYSTAL MATERIALS Co., Ltd.
ANHUI CRYSTRO CRYSTAL MATERIALS CO., LTD. INNOVATOR FOR MAGNETO OPTICAL CRYSTALS
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4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules,

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4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules,

Model Number : SCR-2026-08-26-03

Crystal Structure : Cubic, space group Ia3d

Lattice Uniformity : Full-wafer ≤ 0.003Å

Dislocation Density : ≤ 10 cm⁻²（ 80% central area）

Total Thickness Variation : ≤ 6 μm

Flatness (Max-Min) : ≤ 6 μm（80% central effective area）

Dielectric Constant : ε ≈ 30

Place of Origin : China

Lattice Constant : 12.497 ± 0.003 Å

Brand Name : Crystro

Nominal Size : 4 inch (Φ101.6 mm)

Payment Terms : T/T,Western Union,MoneyGram

Surface Roughness : Ra ≤ 1 nm，EPI ready

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4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy
The 4-inch SGGG large-size substrate is a high-end specification for next-generation high-speed optical communications (1.6T/CPO) and large-scale production lines. With a diameter of 101.6 mm and standard thickness of 800 ± 30 μm (or custom), it is based on large-size single crystal growth technology. Full-wafer lattice constant uniformity ≤ 0.003 Å, dislocation density ≤ 10 cm⁻², and effective area ≥ 80%. Rotator chip output per wafer increases approximately 75% compared to 3-inch, significantly reducing per-chip cost.
Large-size SGGG crystal growth is technically demanding, requiring strict thermal field control, raw material purity, and annealing processes. Through optimized Czochralski growth and multi-step annealing, this product achieves low-stress, low-absorption, high-uniformity crystal quality. Combined with primary/secondary flats and EPI-grade super-smooth polishing, it meets the large-size mass production requirements of high-end magneto-optical film epitaxy equipment.
Key Functions
High-capacity substrate for 1.6T/CPO era:
4-inch large size adapts to next-gen high-speed module rotator mass production, more chips per wafer
Lower per-chip cost:
~75% larger effective area than 3-inch, dilutes epitaxy, dicing, and inspection costs
High-end magneto-optical film epitaxy:
High lattice uniformity ensures large-area BIG film thickness and magneto-optical performance consistency
Core material for domestic substitution:
Breaks overseas monopoly on large-size SGGG substrates, supports domestic optical module supply chain independence

Product Tags:

4-inch SGGG substrate for Faraday rotator

      

Gadolinium Gallium Garnet single crystal substrate

      

EPI-grade polished substrate for optical modules

      
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